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KMID : 1024520130220091097
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Journal of the Environmental Sciences
2013 Volume.22 No. 9 p.1097 ~ p.1103
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Microwave Thermal Decomposition of CF4 using SiC-Al2O3
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Choi Sung-Woo
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Abstract
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Tetrafluoromethane(CF4) have been widely used as etching and chemical vapor deposition gases for semiconductor
manufacturing processes. CF4 decomposition efficiency using microwave system was carried out as a function of the
microwave power, the reaction temperature, and the quantity of Al2O3 addition. High reaction temperature and addition of
Al2O3 increased the CF4 removal efficiencies and the CO2/CF4 ratio. When the SA30 (SiC+30wt%Al2O3) and SA50
(SiC+50wt%Al2O3) were used, complete CF4 removal was achieved at 1000℃. The CF4 was reacted with Al2O3 and
by-products such as CO2 and AlF3 were produced. Significant amount of by-product such as AlF3 was identified by X-ray
powder diffraction analysis. It also showed that the γ-Al2O3 was transformed to α-Al2O3 after microwave thermal reaction.
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KEYWORD
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CF4, Microwave, γ-Al2O3, Catalyst oxidation
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